Abstract: Device shrinkage requires continuous tightening of the overlay (OVL) control. Systematic deviation between optical after-develop inspection (ADI) and after-etch inspection (AEI) OVL, known ...
Abstract: In this work, we present and make openly available an optimized SPICE-compatible Landau-Khalatnikov (L-K) equivalent ferroelectric model. The proposed model maps L-K equations to a positive ...
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